Deposition of Ceramic Oxide Thin Films by Metalorganic Chemical Vapour Deposition (MOCVD)



April 9, 2021 -14:15 | Online via Zoom (Password: PDEQB@FEUP)

The Metal-Organic Chemical Vapour Deposition (MOCVD) is one of the most important techniques for the deposition of high quality thin films. Actually, it has assumed a great deal of technological importance in the fabrication of optical, electronic and high speed devices. In this seminar we will discuss MOCVD technology, rector design, thermodynamics, metalorganic precursors and equipment related to the deposition of ceramic oxides. Examples will be provided for the deposition of simple oxides like MoO3, HfO2, TiO2 VOx, FeOx, In2O3 and ZnO. The perovskites and derivate structures such as Ruddlesden Popper and high-Tc Cu based superconductors will be reviewed. Important aspects in the MOCVD deposition of these complex oxides will be addressed, in particular techniques for film composition optimization and strain engineering due to epitaxy relationships between adlayers and substrates.

Prof. Pedro Tavares obtained his degree in Chemical Engineering from the Faculty of Engineering of the University of Porto (1985). He completed his PhD in Chemistry at the University of Trás-os-Montes and Alto Douro (2001), with the thesis entitled “Superconducting Thin Films of the Bi-Sr-Ca-Cu-O System Obtained by Aerosol-Assisted Metalorganic Chemical Vapour Deposition”. He is currently Associate Professor in the Department of Chemistry at the University of Trás-os-Montes and Alto Douro, since 2006 and member of CQVR an I&D unit that performs investigation in Chemistry. The fields of interests are related to materials chemistry, in particular mixed valence ceramic oxides, thin film deposition (MOCVD, sputtering and PLD) and materials characterisation (Electronic Microscopy and X-ray Diffraction). Multiferroic, ferromagnetic, ferroelectric, catalysts are the major properties of concern


[Host: Joaquim L Faria, Associate Laboratory, LSRE-LCM]