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BEGIN:VEVENT
UID:7@deq.fe.up.pt
DTSTART:20210409T141500Z
DTEND:20210409T141500Z
DTSTAMP:20210409T161352Z
URL:https://deq.fe.up.pt/events/seminarios-by-deq-feup-deposition-of-ceram
 ic-oxide-thin-films-by-metalorganic-chemical-vapour-deposition-mocvd/
SUMMARY:Deposition of Ceramic Oxide Thin Films by Metalorganic Chemical Vap
 our Deposition (MOCVD)
DESCRIPTION:April 9\, 2021 -14:15 | Online via Zoom https://videoconf-colib
 ri.zoom.us/j/81960462138 (Password: PDEQB@FEUP)\n\nThe Metal-Organic Chemi
 cal Vapour Deposition (MOCVD) is one of the most important techniques for 
 the deposition of high quality thin films. Actually\, it has assumed a gre
 at deal of technological importance in the fabrication of optical\, electr
 onic and high speed devices. In this seminar we will discuss MOCVD technol
 ogy\, rector design\, thermodynamics\, metalorganic precursors and equipme
 nt related to the deposition of ceramic oxides. Examples will be provided 
 for the deposition of simple oxides like MoO3\, HfO2\, TiO2 VOx\, FeOx\, I
 n2O3 and ZnO. The perovskites and derivate structures such as Ruddlesden P
 opper and high-Tc Cu based superconductors will be reviewed. Important asp
 ects in the MOCVD deposition of these complex oxides will be addressed\, i
 n particular techniques for film composition optimization and strain engin
 eering due to epitaxy relationships between adlayers and substrates.\n\n\n
 \nProf. Pedro Tavares obtained his degree in Chemical Engineering from the
  Faculty of Engineering of the University of Porto (1985). He completed hi
 s PhD in Chemistry at the University of Trás-os-Montes and Alto Douro (20
 01)\, with the thesis entitled “Superconducting Thin Films of the Bi-Sr-
 Ca-Cu-O System Obtained by Aerosol-Assisted Metalorganic Chemical Vapour D
 eposition”. He is currently Associate Professor in the Department of Che
 mistry at the University of Trás-os-Montes and Alto Douro\, since 2006 an
 d member of CQVR an I&amp\;D unit that performs investigation in Chemistry
 . The fields of interests are related to materials chemistry\, in particul
 ar mixed valence ceramic oxides\, thin film deposition (MOCVD\, sputtering
  and PLD) and materials characterisation (Electronic Microscopy and X-ray 
 Diffraction). Multiferroic\, ferromagnetic\, ferroelectric\, catalysts are
  the major properties of concern\n\n\n\n&nbsp\;\n\n[Host: Joaquim L Faria\
 , Associate Laboratory\, LSRE-LCM]
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